Multi-Patterning Techniques: Enabling Dimensions Beyond Lithography Resolution Limits
2:54
YouTubeLam Research
Multi-Patterning Techniques: Enabling Dimensions Beyond Lithography Resolution Limits
Lam Research demonstrates its advanced techniques for multiple patterning to create minute features on semiconductors. At sub-20 nanometer nodes, self-aligned patterning is used for line pitch scaling, which requires an increased number of deposition and etch steps to achieve dimensions beyond the lithography resolution limit. The self-aligned ...
59K viewsNov 18, 2016
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#Multiple Patterning Techniques
Have you seen our video on multiple patterning? Several clever multiple patterning strategies have been developed to create tiny, densely packed features on chips. Check out our video to learn how the techniques work! | Lam Research Corporation
Have you seen our video on multiple patterning? Several clever multiple patterning strategies have been developed to create tiny, densely packed features on chips. Check out our video to learn how the techniques work! | Lam Research Corporation
FacebookDec 19, 2016
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